TEEIA

真空IR乾燥設備

偉勝乾燥工業股份有限公司

Solution Details

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真空IR乾燥設備

  • 高效能乾燥:(紅外線IR)

紅外線輻射熱能快速升溫,縮短乾燥/固化時間。

紅外線三大特性,穿透、反射、吸收,特定材料固化效果佳。

  • 節能減碳

無需加熱整個空間,僅針對Wafer表面加熱,降低能耗。

與傳統熱風乾燥相比,能源消耗可減少 30%。

  • 均勻性與精準性

紅外線穿透物料內外部同步加熱,有別於熱風乾燥方式。

可根據材料特性選擇紅外線波長,以達到最佳吸收效果。

  • 降低氧化風險:(真空環境)

真空環境中氧氣含量低,防止晶圓在高溫生產過程被氧化。

被烘烤物除泡能力優於大氣行熱風烤箱。

  • 控制能力 : (製程彈性)

多段烘烤配方及參數,多段溫度、真空壓力控制精確。

9區獨立控制系統,確保各個晶圓溫度均勻乾燥。

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